The Sharp Group at the Walter Schottky Institute is devoted to fabrication and
characterization of functional semiconductors and catalysts, as well as their
interfaces, for applications in renewable energy conversion. A current emphasis
of the group is on the discovery and development of materials and combinations of
materials for driving photochemical reactions. Deposition of a range of nitride,
oxynitride, and oxide thin films and nanostructures is accomplished in our group
using techniques including atomic layer deposition, molecular beam epitaxy, and
physical vapor deposition. These approaches allow us to precisely control the
composition, structure, and phase of materials in order to elucidate energy
conversion mechanisms and direct functional properties. To explore material
interactions, defect properties, and chemical transformations at
semiconductor-based solid/solid and solid/liquid interfaces, we utilize a suite of
spectroscopic and microscopic characterization tools. Ongoing work includes
fundamental studies of electronic structure and charge carrier dynamics in
semiconductor photoelectrodes, investigation of interfacial phenomena in
heterostructured materials, and development of multi-functional thin films that
balance optical, electronic, and chemical properties.