Walter Schottky Institute
Center for Nanotechnology and Nanomaterials


Dr. Johanna Eichhorn

Dr. Johanna Eichhorn
Sub-Group Leader

Room S203
Tel.: (+49) 089 289 11426


Publications

Defect Engineering of Ta3N5 Photoanodes: Enhancing Charge Transport and Photoconversion Efficiencies via Ti Doping
Advanced Functional Materials, 2306539 (2023)
L.I. Wagner, E. Sirotti, O. Brune, G. Grötzner, J. Eichhorn, S. Santra, F. Munnik, L. Olivi, S. Pollastri, V. Streibel, I.D. Sharp
Online Ref
Ionic Liquids Tailoring Crystal Orientation and Electronic Properties for Stable Perovskite Solar Cells
Nano Energy 112, 108449 (2023)
Y. Zou, J. Eichhorn, S. Rieger, Y. Zheng, S. Yuan, L. Wolz, L.V. Spanier, J.E. Heger, S. Yin, C.R. Everett, L. Dai, M. Schwartzkopf, C. Mu, S.V. Roth, I.D. Sharp, C.C. Chen, J. Feldmann, S.D. Stranks, P. Müller-Buschbaum
Online Ref
Spatially-Modulated Silicon Interface Energetics via Hydrogen Plasma-Assisted Atomic Layer Deposition of Ultrathin Alumina
Advanced Materials Interfaces 10, 2202166 (2023)
A. Henning, J.D. Bartl, L. Wolz, M. Christis, F. Rauh, M. Bissolo, T. Grünleitner, J. Eichhorn, P. Zeller, M. Amati, L. Gregoratti, J.J. Finley, B. Rieger, M. Stutzmann, I.D. Sharp
Online Ref
Real-Time Investigation of Sulfur Vacancy Generation and Passivation in Monolayer Molybdenum Disulfide via in situ X-ray Photoelectron Spectromicroscopy
ACS Nano 16, 20364 (2022)
T. Grünleitner, A. Henning, M. Bissolo, M. Zengerle, L. Gregoratti, M. Amati, P. Zeller, J. Eichhorn, A.V. Stier, A.W. Holleitner, J.J. Finley, I.D. Sharp
Online Ref
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Advanced Materials Interfaces 9, 2200582 (2022)
M. Kuhl, A. Henning, L. Haller, L.I. Wagner, C.-M. Jiang, V. Streibel, I.D. Sharp, J. Eichhorn
Online Ref
Solution-based synthesis of wafer-scale epitaxial BiVO4 thin films exhibiting high structural and optoelectronic quality
Journal of Materials Chemistry A 10, 12026 (2022)
V.F. Kunzelmann, C.-M. Jiang, I. Ihrke, E. Sirotti, T. Rieth, A. Henning, J. Eichhorn, I.D. Sharp
Online Ref
The Influence of CsBr on Crystal Orientation and Optoelectronic Properties of MAPbI3-Based Solar Cells
ACS Applied Materials and Interfaces 14, 2958 (2022)
Y. Zou, S. Yuan, A. Buyruk, J. Eichhorn, S. Yin, M.A. Reus, T. Xiao, S. Pratap, S. Liang, C.L. Weindl, W. Chen, C. Mu, I.D. Sharp, T. Ameri, M. Schwartzkopf, S.V. Roth, P. Müller-Buschbaum
Online Ref
Indirect bandgap, optoelectronic properties, and photoelectrochemical characteristics of high-purity Ta3N5 photoelectrodes
Journal of Materials Chemistry A 9, 20653 (2021)
J. Eichhorn, S.P. Lechner, C.-M. Jiang, G. Folchi Heunecke, F. Munnik, I.D. Sharp
Online Ref
Nanoscale Heterogeneities and Composition–Reactivity Relationships in Copper Vanadate Photoanodes
ACS Applied Materials and Interfaces 13, 23575 (2021)
J. Eichhorn, C.-M. Jiang, J.K. Cooper, I.D. Sharp, F.M. Toma
Online Ref
Metastable Ta2N3 with Highly Tunable Electrical Conductivity via Oxygen Incorporation
Materials Horizons 8, 1744 (2021)
C.-M. Jiang, L.I. Wagner, M.K. Horton, J. Eichhorn, T. Rieth, V.F. Kunzelmann, M. Kraut, Y. Li, K.A. Persson, I.D. Sharp
Online Ref
Revealing Nanoscale Chemical Heterogeneities in Polycrystalline Mo‐BiVO4 Thin Films
Small 16, 2001600 (2020)
J. Eichhorn, S.E. Reyes‐Lillo, S. Roychoudhury, S. Sallis, J. Weis, D.M. Larson, J.K. Cooper, I.D. Sharp, D. Prendergast, F.M. Toma
Online Ref
Interface engineering for light-driven water oxidation: Unravelling the passivating and catalytic mechanism in BiVO4 overlayers
Sustainable Energy & Fuels 3, 127 (2019)
G. Liu, J. Eichhorn, C.-M. Jiang, M.C. Scott, L.H. Hess, J.M. Gregoire, J.A. Haber, I.D. Sharp, F.M. Toma
Online Ref
Disentangling the role of surface chemical interactions on interfacial charge transport at BiVO4 photoanodes
ACS Appl. Mater. Interf. 10, 35129 (2018)
J. Eichhorn, C. Kastl, A.M. Schwartzberg, I.D. Sharp, F.M. Toma
Online Ref
Nanoscale imaging of charge carrier transport limitations in BiVO4 photoanodes
Nature Communications 9, 2597 (2018)
J. Eichhorn, C. Kastl, J.K. Cooper, D. Ziegler, A.M. Schwartzberg, I.D. Sharp, F.M. Toma





Walter Schottky Institut About the Institute Research

Technische Universität München Annual Reports Photonics & Optoelectronics
Am Coulombwall 4 Events and News Quantum Technologies
D-85748 Garching History of WSI Energy Materials
Germany How to get to WSI Engineered Nanomaterials
Scientific Background Functional Interfaces
Tel: +49-(0)89-289-12761 Seminars Nanofabrication
Fax: +49-(0)89-289-12737 The WSI in Numbers

Partners Publications
(c) 2018 Walter Schottky Institut WSI Association

Intranet





Walter Schottky Institut Navigation

Technische Universität München Contact
Am Coulombwall 4 Groups
D-85748 Garching Institute
Germany Partners
Publications
Tel: +49-(0)89-289-12761 Research
Fax: +49-(0)89-289-12737 Groups
Intranet
(c) 2018 Walter Schottky Institut