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Suppressing substrate oxidation during plasma-enhanced atomic layer deposition on semiconductor surfaces
Appl. Phys. Lett. 124, 071601 (2024)
O. Bienek, T. Rieth, J. Kühne, B. Fuchs, M. Kuhl, L.I. Wagner, L.M. Todenhagen, L. Wolz, A. Henning, I.D. Sharp
Online Ref | Microstrain and Crystal Orientation Variation within Naked Triple-Cation Mixed Halide Perovskites under Heat, UV, and Visible Light Exposure
ACS Energy Letters 9, 388 (2024)
Y. Zou, J. Eichhorn, J. Zhang, F.A.C. Apfelbeck, S. Yin, L. Wolz, C.-C. Chen, I.D. Sharp, P. Müller-Buschbaum
Online Ref | Engineering Defects and Interfaces of Atomic Layer-Deposited TiOx-Protective Coatings for Efficient III–V Semiconductor Photocathodes
ACS Photonics 10, 3985 (2023)
O. Bienek, B. Fuchs, M. Kuhl, T. Rieth, J. Kühne, L.I. Wagner, L.M. Todenhagen, L. Wolz, A. Henning, I.D. Sharp
Online Ref | Ionic Liquids Tailoring Crystal Orientation and Electronic Properties for Stable Perovskite Solar Cells
Nano Energy 112, 108449 (2023)
Y. Zou, J. Eichhorn, S. Rieger, Y. Zheng, S. Yuan, L. Wolz, L.V. Spanier, J.E. Heger, S. Yin, C.R. Everett, L. Dai, M. Schwartzkopf, C. Mu, S.V. Roth, I.D. Sharp, C.C. Chen, J. Feldmann, S.D. Stranks, P. Müller-Buschbaum
Online Ref | Spatially-Modulated Silicon Interface Energetics via Hydrogen Plasma-Assisted Atomic Layer Deposition of Ultrathin Alumina
Advanced Materials Interfaces 10, 2202166 (2023)
A. Henning, J.D. Bartl, L. Wolz, M. Christis, F. Rauh, M. Bissolo, T. Grünleitner, J. Eichhorn, P. Zeller, M. Amati, L. Gregoratti, J.J. Finley, B. Rieger, M. Stutzmann, I.D. Sharp
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Walter Schottky Institut