Oxygen Incorporation as a Route to Nondegenerate Zinc Nitride Semiconductor Thin Films ACS Applied Materials and Interfaces 17, 7958 (2025) E. Sirotti, B. Scaparra, S. Böhm, F. Pantle, L.I. Wagner, F. Rauh, F. Munnik, C.-M. Jiang, M. Kuhl, K. Müller, J. Eichhorn, V. Streibel, I.D. Sharp Online Ref
Atomically Flat Dielectric Patterns for Bandgap Engineering and Lateral Junction Formation in MoSe2 Monolayers Advanced Functional Materials 35, 2418528 (2025) P. Moser, L.M. Wolz, A. Henning, A. Thurn, M. Kuhl, P. Ji, P. Soubelet, M. Schalk, J. Eichhorn, I.D. Sharp, A.V. Stier, J.J. Finley Online Ref
Beyond Cation Disorder: Site Symmetry-Tuned Optoelectronic Properties of the Ternary Nitride Photoabsorber ZrTaN3 Advanced Energy Materials 14, 2402540 (2024) E. Sirotti, L.I. Wagner, C.-M. Jiang, J. Eichhorn, F. Munnik, V. Streibel, M.J. Schilcher, B. März, F.S. Hegner, M. Kuhl, T. Höldrich, K. Müller-Caspary, D.A. Egger, I.D. Sharp Online Ref
Impact of Defects and Disorder on the Stability of Ta3N5 Photoanodes Advanced Functional Materials 34, 2405532 (2024) L.M. Wolz, G. Grötzner, T. Rieth, L.I. Wagner, M. Kuhl, J. Dittloff, G. Zhou, S. Santra, V. Streibel, F. Munnik, I.D. Sharp, J. Eichhorn Online Ref
Zirconium Oxynitride Thin Films for Photoelectrochemical Water Splitting ACS Applied Energy Materials 7, 4004 (2024) V. Streibel, J.L. Schönecker, L.I. Wagner, E. Sirotti, F. Munnik, M. Kuhl, C.-M. Jiang, J. Eichhorn, S. Santra, I.D. Sharp Online Ref
Suppressing substrate oxidation during plasma-enhanced atomic layer deposition on semiconductor surfaces Appl. Phys. Lett. 124, 071601 (2024) O. Bienek, T. Rieth, J. Kühne, B. Fuchs, M. Kuhl, L.I. Wagner, L.M. Todenhagen, L. Wolz, A. Henning, I.D. Sharp Online Ref
Engineering Defects and Interfaces of Atomic Layer-Deposited TiOx-Protective Coatings for Efficient III–V Semiconductor Photocathodes ACS Photonics 10, 3985 (2023) O. Bienek, B. Fuchs, M. Kuhl, T. Rieth, J. Kühne, L.I. Wagner, L.M. Todenhagen, L. Wolz, A. Henning, I.D. Sharp Online Ref
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution Advanced Materials Interfaces 9, 2200582 (2022) M. Kuhl, A. Henning, L. Haller, L.I. Wagner, C.-M. Jiang, V. Streibel, I.D. Sharp, J. Eichhorn Online Ref
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