Suppressing substrate oxidation during plasma-enhanced atomic layer deposition on semiconductor surfaces Appl. Phys. Lett. 124, 071601 (2024) O. Bienek, T. Rieth, J. Kühne, B. Fuchs, M. Kuhl, L.I. Wagner, L.M. Todenhagen, L. Wolz, A. Henning, I.D. Sharp Online Ref
Tuning Carbon Dioxide Reduction Reaction Selectivity of Bi Single-Atom Electrocatalysts with Controlled Coordination Environments ChemSusChem, e202301452 (2024) S. Santra, V. Streibel, L.I. Wagner, N. Cheng, P. Ding, G. Zhou, E. Sirotti, R. Kisslinger, T. Rieth, S. Zhang, I.D. Sharp Online Ref
Defect Engineering of Ta3N5 Photoanodes: Enhancing Charge Transport and Photoconversion Efficiencies via Ti Doping Advanced Functional Materials 34, 2306539 (2024) L.I. Wagner, E. Sirotti, O. Brune, G. Grötzner, J. Eichhorn, S. Santra, F. Munnik, L. Olivi, S. Pollastri, V. Streibel, I.D. Sharp Online Ref
Engineering Defects and Interfaces of Atomic Layer-Deposited TiOx-Protective Coatings for Efficient III–V Semiconductor Photocathodes ACS Photonics 10, 3985 (2023) O. Bienek, B. Fuchs, M. Kuhl, T. Rieth, J. Kühne, L.I. Wagner, L.M. Todenhagen, L. Wolz, A. Henning, I.D. Sharp Online Ref
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution Advanced Materials Interfaces 9, 2200582 (2022) M. Kuhl, A. Henning, L. Haller, L.I. Wagner, C.-M. Jiang, V. Streibel, I.D. Sharp, J. Eichhorn Online Ref
Metastable Ta2N3 with Highly Tunable Electrical Conductivity via Oxygen Incorporation Materials Horizons 8, 1744 (2021) C.-M. Jiang, L.I. Wagner, M.K. Horton, J. Eichhorn, T. Rieth, V.F. Kunzelmann, M. Kraut, Y. Li, K.A. Persson, I.D. Sharp Online Ref
Control of Band Gap and Band Edge Positions in Gallium–Zinc Oxynitride Grown by Molecular Beam Epitaxy J. Phys. Chem. C 124, 7668 (2020) M. Kraut, E. Sirotti, F. Pantle, C.-M. Jiang, G. Grötzner, M. Koch, L.I. Wagner, I.D. Sharp, M. Stutzmann Online Ref
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