Suppressing substrate oxidation during plasma-enhanced atomic layer deposition on semiconductor surfaces Appl. Phys. Lett. 124, 071601 (2024) O. Bienek, T. Rieth, J. Kühne, B. Fuchs, M. Kuhl, L.I. Wagner, L.M. Todenhagen, L. Wolz, A. Henning, I.D. Sharp Online Ref
Annealing-Free Ohmic Contacts to n-Type GaN via Hydrogen Plasma-Assisted Atomic Layer Deposition of Sub-Nanometer AlOx Advanced Materials Interfaces 11, 2300758 (2024) M. Christis, A. Henning, J.D. Bartl, A. Zeidler, B. Rieger, M. Stutzmann, I.D. Sharp Online Ref
Engineering Defects and Interfaces of Atomic Layer-Deposited TiOx-Protective Coatings for Efficient III–V Semiconductor Photocathodes ACS Photonics 10, 3985 (2023) O. Bienek, B. Fuchs, M. Kuhl, T. Rieth, J. Kühne, L.I. Wagner, L.M. Todenhagen, L. Wolz, A. Henning, I.D. Sharp Online Ref
Tunable Encapsulation and Doping of Monolayer MoS2 by In Situ Probing of Excitonic Properties During Atomic Layer Deposition Advanced Materials Interfaces 10, 2202429 (2023) A. Henning, S. Levashov, C. Qian, T. Grünleitner, J. Primbs, J.J. Finley, I.D. Sharp Online Ref
Spatially-Modulated Silicon Interface Energetics via Hydrogen Plasma-Assisted Atomic Layer Deposition of Ultrathin Alumina Advanced Materials Interfaces 10, 2202166 (2023) A. Henning, J.D. Bartl, L. Wolz, M. Christis, F. Rauh, M. Bissolo, T. Grünleitner, J. Eichhorn, P. Zeller, M. Amati, L. Gregoratti, J.J. Finley, B. Rieger, M. Stutzmann, I.D. Sharp Online Ref
Real-Time Investigation of Sulfur Vacancy Generation and Passivation in Monolayer Molybdenum Disulfide via in situ X-ray Photoelectron Spectromicroscopy ACS Nano 16, 20364 (2022) T. Grünleitner, A. Henning, M. Bissolo, M. Zengerle, L. Gregoratti, M. Amati, P. Zeller, J. Eichhorn, A.V. Stier, A.W. Holleitner, J.J. Finley, I.D. Sharp Online Ref
Using Metal−Organic Frameworks to Confine Liquid Samples for Nanoscale NV-NMR Nano Letters 22, 9876 (2022) K.S. Liu, X. Ma, R. Rizzato, A.L. Semrau, A. Henning, I.D. Sharp, R.A. Fischer, D.B. Bucher Online Ref
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution Advanced Materials Interfaces 9, 2200582 (2022) M. Kuhl, A. Henning, L. Haller, L.I. Wagner, C.-M. Jiang, V. Streibel, I.D. Sharp, J. Eichhorn Online Ref
Solution-based synthesis of wafer-scale epitaxial BiVO4 thin films exhibiting high structural and optoelectronic quality Journal of Materials Chemistry A 10, 12026 (2022) V.F. Kunzelmann, C.-M. Jiang, I. Ihrke, E. Sirotti, T. Rieth, A. Henning, J. Eichhorn, I.D. Sharp Online Ref
Electronically Tunable Transparent Conductive Thin Films for Scalable Integration of 2D Materials with Passive 2D–3D Interfaces Advanced Functional Materials 32, 2111343 (2022) T. Grünleitner, A. Henning, M. Bissolo, A. Kleibert, C.A.F. Vaz, A.V. Stier, J.J. Finley, I.D. Sharp Online Ref
Modular Assembly of Vibrationally and Electronically Coupled Rhenium Bipyridine Carbonyl Complexes on Silicon J. Am. Chem. Soc. 143, 19505 (2021) J.D. Bartl, C. Thomas, A. Henning, M.F. Ober, G. Savasci, B. Yazdanshenas, P.S. Deimel, E. Magnano, F. Bondino, P. Zeller, L. Gregoratti, M. Amati, C. Paulus, F. Allegretti, A. Cattani-Scholz, J.V. Barth, C. Ochsenfeld, B. Nickel, I.D. Sharp, M. Stutzmann, B. Rieger Online Ref
Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN Advanced Functional Materials 31, 2101441 (2021) A. Henning, J.D. Bartl, A. Zeidler, S. Qian, O. Bienek, C.-M. Jiang, C. Paulus, B. Rieger, M. Stutzmann, I.D. Sharp Online Ref
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Walter Schottky Institut