III–V Semiconductor Materials

The III–V semiconductor materials group provides a broad array of research activities in epitaxial growth of advanced heterostructures and nanostructures, and the characterization of their structural, electronic, optical and thermal properties. Most of our work capitalizes on the superior electronic and optoelectronic properties of the III–V materials, and exploitation of sophisticated effects at the nanoscale to test their performance in related devices. Large emphasis is placed on molecular beam epitaxial (MBE) growth of ultra–high mobility GaAs–based two–dimensional electron gas (2DEG) heterostructures, novel In(Ga,Al)As–based quantum dots and nanowires on silicon and unique in situ methods (cleaved edge overgrowth) for nanofabrication of sub-nanometer patterns for organic and molecular electronics. All of our work employs the newly established, advanced nanofabrication and characterization facilities at the Center for Nanotechnology and Nanomaterials at WSI.

 

Group members

Group Leader       Ph.D. Students

 

 

 

 

 

 

 

 

Engineer              Diploma/Master Students

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

Bachelor Students/Interns

Ludwig Asen, Jonathan Becker, Bernhard Loitsch, Pascal Wittlich

Alumni (Diploma Students)

Andreas Brenneis, Florian Herzog, Emanuel Forster, Nicolas Hörmann

Current Research Topics

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

Funding

Funding by the following institutions is gratefully acknowledged

  • Deutsche Forschungsgemeinschaft (Sonderforschungsbereich SFB 631)
  • Nanosystems Initiative Munich (NIM)
  • Marie Curie Actions – FP7–People – International Reintegration Grant (IRG)
  • Bavaria California Technology Center
  • EU FP7 project SOLID
 

Positions

We are always interested in highly motivated students or researchers who would like to work on III–V semiconductor hetero- and nanostructures. Interested applicants should contact Dr. Gregor Koblmüller or Prof. Gerhard Abstreiter

 

Currently available:


Recent Publications

A list of recent publications can be found here

 

Previous Publications (group leader)

A list of all previous publications of the group leader can be found here

 
TUM Technische Universität München TUM Technische Universität München Physik Department Elektrotechnik und Informationstechnik TUM Technische Universität München
 

Contact

Dr. Gregor Koblmüller
Tel :: +49 89 289 12779
Office :: S315
Email :: gregor.koblmueller@wsi.tum.de

Events (2011)

11/28-12/02  2011 MRS Fall Meeting, Boston

  • Purely Catalyst-free MBE Growth and Electrical Properties of InAs NWs on Si
    Simon Hertenberger – Oral Presentation
  • Optoelectronic Properties of Core-Shell GaAs-AlGaAs NW Heterostructures
    Daniel Rudolph – Oral Presentation

 

09/11-09/16  SemiconNano 2011, Traunkirchen Austria

  • Self-assembled and Site-selective Growth of InAs NWs
    Simon Hertenberger – Oral Presentation
  • Catalyst-free MBE Growth of (Al)GaAs NW Heterostructures on Si
    Daniel Rudolph – Poster Presentation

     

    09/08-09/09  Topical Workshop on Arsenide-based NWs, PDI Berlin 

    • Self-induced and Site-controlled Growth of Vertical Group-III Arsenide Nanowires
      Simon Hertenberger, Daniel Rudolph, and Gregor Koblmüller - Invited Talk

     

    07/25-07/29  EP2DS19/MSS15, Tallahassee, Florida

    • Au-free GaAs NWs on Silicon
      Daniel Rudolph– Poster Presentation

     

    05/22-05/26  International Symposium on Compound Semiconductors (ISCS), Berlin

    • Catalyst-free Growth of InAs NW Arrays on Si (111) by MBE
      Gregor Koblmüller– Invited Talk -

    05/09-05/13  E-MRS Spring Meeting, Nice, France

    • Polar and Non-Polar InN grown by MBE
      Gregor Koblmüller– Invited Talk

     

    04/21-04/25  Villa Conference on Interactions Among Nanostructures (VCIAN-2011), Las Vegas

    • Site-controlled Growth and Properties of Catalyst-free III-As NW Arrays on Si
      Gregor Koblmüller– Invited Talk

     

    03/13–03/18  DPG Frühjahrstagung, Dresden

    • Autocatalytic Growth of GaAs NWs on Si (111) using different SiOx Templates
      Watcharapong Paosangthong– Oral Presentation 
    • Optical Properties of Positioned InAs-based NW Arrays
      Andreas Brenneis– Poster Presentation