Resources
The WSI is equipped with state-of-the-art equipment for semiconductor preparation, characterization, and device technology:
Material preparation
- MBE and CBE machines for GaAs, InP, and Sb based heterostructures
- Ultrahigh purity GaAs MBE machine (electron mobilities > 10 Mio cm2/Vs)
- MBE and MOCVD machines for GaN based systems
- MBE machines for SiGe epitaxy
- Plasma-enhanced Si-CVD
- UHV evaporation equipment for magnetic thin films
Characterization and spectroscopy tools
- High resolution X-ray diffraction
- Atomic force microscopy
- Electron microscopy and EDX equipment
- Photoluminescence (from IR to UV)
- Raman spectrometers
- DLTS, Optical DLTS, CV-profiling
- Hall measurements and magneto-transport
- FTIR spectroscopy
- High frequency parameter analyzers
- Spin resonance (ODMR, EDMR)
- He3 cryostats with magnetic fields up to 15 and 17 Tesla
Semiconductor Technology
- 250 m2 class 100 clean room facility with photolithography, e-beam lithography, reactive ion etching, metallization
- Special characterization facility for laser diodes
- Pulsed laser materials' processing
IT infrastructure
- Microsoft Windows domain based Client/Server infrastructure with integrated Exchange 2007, Sharepoint Services, and Office Communication Server groupware
- About 300 clients
- High end compute servers
Our computer certificates (for download)